Title :
A hollow-GCPW (HGCPW) as low-loss and wafer-conductivity-free structure on a single silicon wafer
Author :
Nishino, Tamotsu ; Yoshida, Yukihisa ; Suehiro, Yoshiyuki ; Lee, Sang-Seok ; Miyaguchi, Kenichi ; Fukami, Tatsuya ; Oh-hashi, Hideyuki ; Ishida, Osami
Author_Institution :
Inf. Technol. R&D Center, Mitsubishi Electr. Corp., Itami, Japan
Abstract :
A low-loss hollow grounded co-planar waveguide (HGCPW) suitable for a transmission line on a low-resistivity silicon wafer is presented. The HGCPW is disposed in a newly developed dielectric-air-metal (DAM) cavity, which consists of an SiN membrane above a fully metallized cavity made by a micromachining process. Low-loss property is achieved by removing substrate between a signal line and grounds. Existence of a bottom ground metal realizes wafer-conductivity-free structure on a low-resistivity silicon wafer by isolating the line from the substrate completely. Also, the bottom ground enables the impedance to be 50 ohm with narrow line width. HGCPWs on the 6-,μm and 30-μm DAM cavities were fabricated and tested. The measured losses were about 0.3 dB/mm and 0.1 dB/mm respectively at 12 GHz.
Keywords :
coplanar waveguides; elemental semiconductors; micromachining; silicon; sputter etching; surface resistance; 12 GHz; Si; bottom ground metal; dielectric-air-metal cavity; etching holes; hollow grounded coplanar waveguide; low-loss waveguide; low-resistivity wafer; metallized cavity; micromachining; process flow; reactive ion etching; single silicon wafer; transmission line; wafer-conductivity-free structure; Biomembranes; Coplanar transmission lines; Dielectric substrates; Hollow waveguides; Impedance; Loss measurement; Metallization; Micromachining; Silicon compounds; Testing;
Conference_Titel :
Microwave Conference, 2003. 33rd European
Print_ISBN :
1-58053-834-7
DOI :
10.1109/EUMC.2003.1262213