Title :
Autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ multilayer deposition by reactive ECR sputtering for photonic crystals
Author :
Takahashi, C. ; Kaneko, T. ; Kohno, M. ; Sato, K. ; Itomura, D. ; Yoshihara, H.
Author_Institution :
NTT-AT Nanofabrication Corp., Atsugi, Japan
Abstract :
In this paper, we investigated autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ deposition using ECR sputtering, with the goal being a substantial reduction in optical loss.
Keywords :
multilayers; optical losses; photonic crystals; refractive index; silicon compounds; sputter deposition; tantalum compounds; thin films; Ta/sub 2/O/sub 5/-SiO/sub 2/; autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ multilayer deposition; optical loss; photonic crystals; reactive ECR sputtering; Nonhomogeneous media; Optical films; Optical losses; Optical refraction; Optical variables control; Oxidation; Photonic crystals; Radio frequency; Sputtering; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268510
