• DocumentCode
    403444
  • Title

    Autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ multilayer deposition by reactive ECR sputtering for photonic crystals

  • Author

    Takahashi, C. ; Kaneko, T. ; Kohno, M. ; Sato, K. ; Itomura, D. ; Yoshihara, H.

  • Author_Institution
    NTT-AT Nanofabrication Corp., Atsugi, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    44
  • Lastpage
    45
  • Abstract
    In this paper, we investigated autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ deposition using ECR sputtering, with the goal being a substantial reduction in optical loss.
  • Keywords
    multilayers; optical losses; photonic crystals; refractive index; silicon compounds; sputter deposition; tantalum compounds; thin films; Ta/sub 2/O/sub 5/-SiO/sub 2/; autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ multilayer deposition; optical loss; photonic crystals; reactive ECR sputtering; Nonhomogeneous media; Optical films; Optical losses; Optical refraction; Optical variables control; Oxidation; Photonic crystals; Radio frequency; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268510
  • Filename
    1268510
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=403444