DocumentCode :
403599
Title :
A compact propagation delay model for deep-submicron CMOS gates including crosstalk
Author :
Rosselló, J.L. ; Segura, J.
Author_Institution :
Electron. Technol. Group, Balearic Islands Univ., Spain
Volume :
2
fYear :
2004
fDate :
16-20 Feb. 2004
Firstpage :
954
Abstract :
We present a compact, fully physical, analytical model for the propagation delay and the output transition time of deep-submicron CMOS gates. The model accounts for crosstalk effects, short-circuit currents, the input-output coupling capacitance and carrier velocity saturation effects. It is based on the nth-power law MOSFET model and computes the propagation delay from the charge delivered to the gate. Comparison with HSPICE simulations and other previously published models for different submicron technologies show significant improvements in terms of accuracy.
Keywords :
CMOS integrated circuits; MOSFET; SPICE; capacitance; crosstalk; delays; short-circuit currents; HSPICE simulations; MOSFET model; carrier velocity saturation effects; compact propagation delay model; complementary metal oxide semiconductor gates; coupling capacitance; crosstalk effects; deep submicron CMOS gates; metal oxide semiconductor field effect transistor model; power law; short circuit currents; simulation program with integrated circuit emphasis; submicron technologies; transition time; Crosstalk; MOS devices; Propagation delay; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation and Test in Europe Conference and Exhibition, 2004. Proceedings
ISSN :
1530-1591
Print_ISBN :
0-7695-2085-5
Type :
conf
DOI :
10.1109/DATE.2004.1269016
Filename :
1269016
Link To Document :
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