Title :
Impact of asymmetric metal coverage on high performance MOSFET mismatch
Author :
Fukumoto, Jay ; Burleson, Jeff ; Das, Tejasvi ; Moon, J.E. ; Mukund, P.R.
Author_Institution :
LSI Logic Corp., Menlo Park, CA, USA
Abstract :
This paper presents a comprehensive study of the impact of asymmetric metal coverage on matched high performance MOSFET pairs for applications. Test structures were fabricated on LSI 0.18 μm technology, and measurement results are presented on the impact of a asymmetric coverage of five aluminium metal layers on the transistor pairs.
Keywords :
MOSFET; large scale integration; semiconductor technology; 1.8 micron; MOSFET mismatch; aluminium metal layers; asymmetric metal coverage; transistor pairs; Aluminum; Degradation; Intrusion detection; Large scale integration; MOS devices; MOSFET circuits; Pattern matching; Radio frequency; Routing; Testing;
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
DOI :
10.1109/ISDRS.2003.1272201
