DocumentCode
404833
Title
Study of pn junctions using genetic algorithm optimizer
Author
Mitra, Mala ; Singh, N.B.
Author_Institution
Indo-Fuji Inf. Technol. Pvt. Ltd., Bangalore, India
Volume
1
fYear
2003
fDate
15-17 Oct. 2003
Firstpage
479
Abstract
An efficient general-purpose optimizer based on "genetic algorithms" has been developed. The efficacy of the optimizer has been well demonstrated by implementing it for parameter extraction of pn junction diodes. With this technique, device parameters like built-in potential and grading coefficient for any diode can be extracted. If the grading coefficient shows the junction to be linear graded, effective diode area and doping gradient have been extracted. If the junction turns out to be an abrupt one, effective area and doping concentrations of each side have been obtained. It is also possible to obtain process parameters for other kinds of junctions with the inclusion of suitable models. This parameter extraction technique has been applied successfully to measured data for real diodes as well as simulated data with different noise levels.
Keywords
doping profiles; genetic algorithms; semiconductor device measurement; semiconductor device models; semiconductor diodes; abrupt graded junction; built-in potential; doping gradient; effective diode area; genetic algorithm optimizer; grading coefficient; junction doping profile; linear graded junction; pn junction diode parameter extraction; process parameters; Area measurement; Capacitance; Current measurement; Data mining; Diodes; Doping profiles; Genetic algorithms; Information technology; Micromechanical devices; Parameter extraction;
fLanguage
English
Publisher
ieee
Conference_Titel
TENCON 2003. Conference on Convergent Technologies for the Asia-Pacific Region
Print_ISBN
0-7803-8162-9
Type
conf
DOI
10.1109/TENCON.2003.1273368
Filename
1273368
Link To Document