DocumentCode :
405392
Title :
Reliability of oxide confined 850 nm VCSELs for high speed interconnection systems
Author :
Sato, Tadayda ; Iwai, Norihiro ; Haga, Yoshinori ; Ariga, Maiko ; Hama, Takeshi ; Shimizu, Hitoshi ; Kasukawa, Akihiko
Author_Institution :
Yokohama R&D Labs., Furukawa Electr. Co. Ltd., Yokohama, Japan
Volume :
1
fYear :
2003
fDate :
15-19 Dec. 2003
Abstract :
The reliability of oxide confined 850 nm VCSELs for 10 Gb/s operation was investigated. The median life with criteria of 2 dB decrease of output power at environmental temperature of 25°C was over 10 million hours.
Keywords :
optical interconnections; surface emitting lasers; 10 Gbit/s; 25 C; 850 nm; VCSEL output power; environmental temperature; high speed interconnection system; oxide confined VCSEL; Accelerated aging; Costs; Life estimation; Local area networks; Power generation; Surface emitting lasers; Temperature; Testing; Threshold voltage; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
Type :
conf
DOI :
10.1109/CLEOPR.2003.1274624
Filename :
1274624
Link To Document :
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