DocumentCode :
405527
Title :
Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays
Author :
Wang, Kenvin ; Bohringer, Karl E.
Author_Institution :
Dept. of Electr. Eng., Washington Univ., Seattle, WA, USA
Volume :
1
fYear :
2003
fDate :
15-19 Dec. 2003
Abstract :
This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.
Keywords :
etching; micromirrors; optical arrays; optical fabrication; optical windows; sputter etching; time division multiplexing; etching window; fabricate micromirror array; high numerical aperture; paraboloidal micromirror array; time-multiplexed plasma-etching; Apertures; Etching; Fabrication; Lenses; Micromirrors; Mirrors; Optical reflection; Plasma applications; Plasma properties; Resonance light scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
Type :
conf
DOI :
10.1109/CLEOPR.2003.1274774
Filename :
1274774
Link To Document :
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