DocumentCode :
405761
Title :
The key technologies of performance optimization for nanometer routing
Author :
Tong Jing ; Xianlong Hong
Author_Institution :
Dept. of Comput. Sci. & Technol., Tsinghua Univ., Beijing, China
Volume :
1
fYear :
2003
fDate :
21-24 Oct. 2003
Firstpage :
118
Abstract :
Routing plays an important role in VLSI/ULSI physical design. It is useful to develop advanced and efficient routers. The main nano challenge to routing is to perform "rigorous" performance optimization. The shrinking of geometry brings great concerns for chip performance. Interconnect effects cause longer delay. The decreasing of interconnect spacing has made the inter-wire coupling capacitance the dominant part of load capacitance, which causes longer delay and coupling noise (crosstalk). This paper discusses the key technologies of performance optimization for nanometer routing. One is the interconnect optimization, which includes delay/noise modeling and interconnect architecture. The other is the performance optimization for all nets routing, which focuses on multi-constraints optimization and multi-level optimization.
Keywords :
ULSI; VLSI; nanotechnology; network routing; optimisation; VLSI/ULSI physical design; coupling noise; crosstalk; delay/noise modeling; inter wire coupling capacitance; interconnect architecture; interconnect effects; interconnect optimization; interconnect spacing; load capacitance; multiconstraints optimization; multilevel optimization; nanometer routing; nets routing; performance optimization; ultra large scale integration design; very large scale integration design;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC, 2003. Proceedings. 5th International Conference on
ISSN :
1523-553X
Print_ISBN :
0-7803-7889-X
Type :
conf
DOI :
10.1109/ICASIC.2003.1277504
Filename :
1277504
Link To Document :
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