• DocumentCode
    405761
  • Title

    The key technologies of performance optimization for nanometer routing

  • Author

    Tong Jing ; Xianlong Hong

  • Author_Institution
    Dept. of Comput. Sci. & Technol., Tsinghua Univ., Beijing, China
  • Volume
    1
  • fYear
    2003
  • fDate
    21-24 Oct. 2003
  • Firstpage
    118
  • Abstract
    Routing plays an important role in VLSI/ULSI physical design. It is useful to develop advanced and efficient routers. The main nano challenge to routing is to perform "rigorous" performance optimization. The shrinking of geometry brings great concerns for chip performance. Interconnect effects cause longer delay. The decreasing of interconnect spacing has made the inter-wire coupling capacitance the dominant part of load capacitance, which causes longer delay and coupling noise (crosstalk). This paper discusses the key technologies of performance optimization for nanometer routing. One is the interconnect optimization, which includes delay/noise modeling and interconnect architecture. The other is the performance optimization for all nets routing, which focuses on multi-constraints optimization and multi-level optimization.
  • Keywords
    ULSI; VLSI; nanotechnology; network routing; optimisation; VLSI/ULSI physical design; coupling noise; crosstalk; delay/noise modeling; inter wire coupling capacitance; interconnect architecture; interconnect effects; interconnect optimization; interconnect spacing; load capacitance; multiconstraints optimization; multilevel optimization; nanometer routing; nets routing; performance optimization; ultra large scale integration design; very large scale integration design;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC, 2003. Proceedings. 5th International Conference on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7889-X
  • Type

    conf

  • DOI
    10.1109/ICASIC.2003.1277504
  • Filename
    1277504