Industrial applications of pulsed wire discharge

Author

Jiang, W. ; Suzuki, T. ; Suematsu, H. ; Yatsui, K.

Author_Institution

Extreme Energy-Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan

Volume

1

fYear

2003

fDate

15-18 June 2003

Firstpage

433

Abstract

Pulsed wire discharge (PWD) has potential applications in material synthesis and processing. We are developing PWD for material applications in two directions, 1) applying high-speed gas puff on PWD and 2) depositing metal thin films by PWD. In this paper, we have developed a high-speed gas puff device that is capable of generating instantaneous ambient gas pressure of 400 Torr around the wire with rising and falling time on the order of milliseconds. The effect of breakdown prevention by the gas puff is observed in nitrogen gas. Copper thin films were obtained by PWD in vacuum. Uniform films were obtained only when fast capacitor bank was used.

Keywords

copper; discharges (electric); electric breakdown; exploding wires; metallic thin films; pulsed power technology; vacuum deposited coatings; breakdown prevention effect; capacitor bank; gas pressure; high-speed gas puff device; material processing; material synthesis; metal thin film deposition; pulsed wire discharge; uniform film; Capacitors; Copper; Electric breakdown; Inorganic materials; Nitrogen; Plasma materials processing; Powders; Sputtering; Transistors; Wire;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Conference, 2003. Digest of Technical Papers. PPC-2003. 14th IEEE International

Conference_Location

Dallas, TX, USA

Print_ISBN

0-7803-7915-2

Type

conf

DOI

10.1109/PPC.2003.1277744

Filename

1277744