Multilayer diffraction grating (MDG) as a base of polaritonic optochemical sensor

Author

Dmitruk, N.L. ; Karpovych, V.V. ; Mayeva, O.I. ; Mamontova, I.B. ; Kondratenko, O.S. ; Yastrubchak, O.B.

Author_Institution

Inst. for Phys. of Semicond., NAS, Ukraine

Volume

1

fYear

2003

fDate

22-24 Oct. 2003

Firstpage

97

Abstract

High sensitive polariton sensors for detection of liquid surroundings have been made on the basis of the metal-semiconductor heterostructures (SBH) with diffraction gratings (bigratings) as an active interface. Because the sensor sensitivity is determined by both the geometrical and structural characteristics of thin metal textured films, the influence of technology (holographic technique, thermal annealing, coatings, etc.) has been investigated. Atomic force microscopy (AFM) and optical methods (ellipsometry, reflectance spectra) were used.

Keywords

atomic force microscopy; chemical sensors; diffraction gratings; ellipsometry; optical multilayers; reflectivity; semiconductor-metal boundaries; thin films; active interface; atomic force microscopy; ellipsometry; geometrical characteristics; high sensitive polariton sensor; holographic technique; liquid surrounding detection; metal-semiconductor heterostructures; multilayer diffraction grating; optical methods; polaritonic optochemical sensor; reflectance spectra; sensor sensitivity; structural characteristics; thermal annealing; thin metal textured films; Atom optics; Atomic force microscopy; Diffraction gratings; Holography; Nonhomogeneous media; Optical diffraction; Optical films; Optical microscopy; Sensor phenomena and characterization; Thermal sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

Sensors, 2003. Proceedings of IEEE

Print_ISBN

0-7803-8133-5

Type

conf

DOI

10.1109/ICSENS.2003.1278904

Filename

1278904