DocumentCode :
41008
Title :
Improved High Frequency Response and Quality Factor of On-Chip Ferromagnetic Thin Film Inductors by Laminating and Patterning Co-Zr-Ta-B Films
Author :
Hao Wu ; Shirong Zhao ; Gardner, Donald S. ; Hongbin Yu
Author_Institution :
Ira A. Fulton Schools of Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
49
Issue :
7
fYear :
2013
fDate :
Jul-13
Firstpage :
4176
Lastpage :
4179
Abstract :
In this work, we report the improvement of high frequency response and quality factor of on-chip inductors by integrating ferromagnetic thin films (Co-Zr-Ta-B) including two different combinations of laminations and 500 nm thick non-laminated film. Up to 4.2X increase in inductance and 5X increase in quality factor (Q) was obtained from 4-turn spiral inductors incorporated with 50 nm by 10 laminated films with a peak Q at 500 MHz. Effects of patterning magnetic film have also been investigated by changing magnetic thin film aspect ratio. It was demonstrated that the peak Q can be pushed towards using higher frequencies as high as 1 GHz by a combination of patterning magnetic films into fine bars and laminations.
Keywords :
boron alloys; cobalt alloys; ferromagnetic materials; laminations; magnetic thin films; tantalum alloys; thin film inductors; zirconium alloys; 4-turn spiral inductors; ferromagnetic thin film integration; fine bars; frequency 500 MHz; high frequency response; laminated films; laminations; magnetic thin film patterning; nonlaminated films; on-chip ferromagnetic thin film inductors; on-chip inductors; quality factor; size 50 nm; size 500 nm; Bars; Inductance; Inductors; Magnetic domains; Magnetic resonance; Q-factor; System-on-chip; Magnetic thin film; on-chip inductors; patterned laminations; radio frequency (RF);
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2013.2249500
Filename :
6559171
Link To Document :
بازگشت