DocumentCode
41086
Title
Assessing the Performance of Surface Passivation Using Low-Intensity Photoluminescence Characterization Techniques
Author
Chan, Catherine E. ; Abbott, Malcolm D. ; Juhl, Mattias Klaus ; Hallam, Brett J. ; Bo Xiao ; Wenham, Stuart R.
Author_Institution
Sch. of Photovoltaic & Renewable Energy Eng., Univ. of New South Wales, Sydney, NSW, Australia
Volume
4
Issue
1
fYear
2014
fDate
Jan. 2014
Firstpage
100
Lastpage
106
Abstract
This paper applies quasi-steady-state photoluminescence (QSS-PL) and photoluminescence imaging to characterize the recombination properties of various surface passivation techniques. Particular interest is given to the performance at low excess carrier densities where many types of surface passivation show a strong increase in surface recombination velocity. These techniques are then used to further understand the ability of parasitic effects such as nonuniform illumination, edge recombination and areas of high recombination to affect these measurements. Furthermore, a new technique for edge isolation using laser doping is shown to be effective against the effect of edge recombination. This technique is useful to implement when using QSS-PL to analyze small samples as carriers conducted to the edge regions can dramatically alter the effective lifetime in low injection.
Keywords
carrier density; elemental semiconductors; isolation technology; passivation; photoluminescence; silicon; surface recombination; Si; edge isolation; edge recombination effect; edge regions; effective lifetime; excess carrier densities; high recombination areas; laser doping; low-intensity photoluminescence characterization techniques; nonuniform illumination; parasitic effects; photoluminescence imaging; quasisteady-state photoluminescence; recombination properties; surface passivation performance; surface passivation techniques; surface recombination velocity; Aluminum oxide; Area measurement; Charge carrier density; Lighting; Passivation; Silicon; Charge carrier lifetime; photoluminescence (PL); silicon; surface passivation;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2013.2282739
Filename
6623080
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