DocumentCode
411647
Title
Submicron periodically poled flux grown KTiOPO/sub 4/ for optical applications
Author
Canalias, C. ; Pasiskevicius, V. ; Clemens, R. ; Laurell, F.
Author_Institution
Dept. of Laser Phys. & Quantum Opt., R. Inst. of Technol., Stockholm, Sweden
fYear
2003
fDate
6-6 June 2003
Abstract
0.5 mm thick flux grown KTiOPO/sub 4/ has been poled with 800 nm domain period by employing electron-beam lithography and electric field poling. The structures can be used as an electrically amplitude adjustable Bragg reflector.
Keywords
crystal growth from solution; distributed Bragg reflectors; electron beam lithography; optical materials; periodic structures; potassium compounds; titanium compounds; 0.5 mm; 800 nm; KTP; KTiOPO4; electric field poling; electrically amplitude adjustable Bragg reflector; electron-beam lithography; optical applications; submicron periodically poled flux grown KTiOPO/sub 4/; Etching; Ferroelectric materials; Lithography; Optical filters; Optical refraction; Optical sensors; Optical variables control; Reflectivity; Refractive index; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1297726
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