DocumentCode
411851
Title
Generation of photonic crystal patterns by single-spot electron beam lithography
Author
Kim, S. ; Chong, H. ; De La Rue, R.M. ; Marsh, J.H. ; Bryce, A.C.
Author_Institution
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
fYear
2003
fDate
6-6 June 2003
Abstract
A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multispot scheme has been achieved.
Keywords
electron beam lithography; optical fabrication; photonic crystals; job time; multi-spot scheme; patterning photonic crystal structure; photonic crystal pattern; single-spot electron beam lithography; Electron beams; Holography; Lithography; Optical device fabrication; Photonic crystals; Resists; Scanning electron microscopy; Telephony; Testing; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1297998
Link To Document