DocumentCode
411878
Title
Multiphoton absorption in laser modified sites of fused silica substrates
Author
Walser, Ardie D. ; Dorsinville, Roger ; Demos, Stavros G.
Author_Institution
Dept. of Electr. Eng., City Coll. & Graduate Center of CUNY, New York, NY, USA
fYear
2003
fDate
6-6 June 2003
Abstract
We have conducted transmission measurements in laser modified and pristine sites of fused silica substrates at 355 nm, 532 nm and 1064 nm. Multiphoton absorption at 355 nm was considerably stronger in the modified regions compared to pristine sites and was strongly dependent on the excitation wavelength.
Keywords
laser beam effects; multiphoton processes; optical materials; silicon compounds; substrates; 1064 nm; 355 nm; 532 nm; SiO/sub 2/; excitation wavelength; fused silica substrates; laser modified sites; multiphoton absorption; pristine sites; transmission measurements; Absorption; Laser mode locking; Nonlinear optics; Optical materials; Optical pulses; Optical saturation; Photoluminescence; Plasma measurements; Silicon compounds; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1298025
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