DocumentCode :
411878
Title :
Multiphoton absorption in laser modified sites of fused silica substrates
Author :
Walser, Ardie D. ; Dorsinville, Roger ; Demos, Stavros G.
Author_Institution :
Dept. of Electr. Eng., City Coll. & Graduate Center of CUNY, New York, NY, USA
fYear :
2003
fDate :
6-6 June 2003
Abstract :
We have conducted transmission measurements in laser modified and pristine sites of fused silica substrates at 355 nm, 532 nm and 1064 nm. Multiphoton absorption at 355 nm was considerably stronger in the modified regions compared to pristine sites and was strongly dependent on the excitation wavelength.
Keywords :
laser beam effects; multiphoton processes; optical materials; silicon compounds; substrates; 1064 nm; 355 nm; 532 nm; SiO/sub 2/; excitation wavelength; fused silica substrates; laser modified sites; multiphoton absorption; pristine sites; transmission measurements; Absorption; Laser mode locking; Nonlinear optics; Optical materials; Optical pulses; Optical saturation; Photoluminescence; Plasma measurements; Silicon compounds; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-748-2
Type :
conf
Filename :
1298025
Link To Document :
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