DocumentCode
412468
Title
Kinoform optics: direct fabrication by F/sub 2/ laser ablation
Author
Nejadmalayeri, Amir H. ; Yick, Andrew ; Li, Jianzhao ; Herman, Peter R.
Author_Institution
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
fYear
2003
fDate
6-6 June 2003
Abstract
A 64/spl times/64 element kinoform was microfabricated in fused silica by direct ablation with a pulsed 157-nm laser source that circumvents multistep lithographic patterning and etching routines. A 4-level design of /spl sim/300-nm etch layers is described.
Keywords
computer-generated holography; diffractive optical elements; etching; fluorine; gas lasers; laser ablation; micro-optics; optical fabrication; photolithography; silicon compounds; 157 nm; 300 nm; F/sub 2/; F/sub 2/ laser ablation; Kinoform optics; SiO/sub 2/; circumvents multistep lithographic patterning; diffractive optics; direct fabrication; etching routines; fused silica; microfabrication; pulsed laser source; Etching; Laser ablation; Laser noise; Optical control; Optical device fabrication; Optical diffraction; Optical distortion; Optical scattering; Silicon compounds; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1298620
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