Title :
First Demonstration of Junctionless Accumulation-Mode Bulk FinFETs With Robust Junction Isolation
Author :
Tae Kyun Kim ; Dong Hyun Kim ; Young Gwang Yoon ; Jung Min Moon ; Byeong Woon Hwang ; Dong-Il Moon ; Gi Seong Lee ; Dong Wook Lee ; Dong Eun Yoo ; Hae Chul Hwang ; Jin Soo Kim ; Yang-Kyu Choi ; Byung Jin Cho ; Seok-Hee Lee
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Abstract :
A junctionless-accumulation-mode (JAM) p-channel MOSFET is successfully implemented based on a junction-isolated bulk FinFET for the first time. The JAM devices with a fin width of 16 nm show outstanding transfer characteristics: 1) subthreshold swing (SSmin) = 68 mV/dec; 2) drain-induced-barrier-lowering is 9 mV/V; and 3) ION/IOFF ratio >1 × 106. The JAM devices with smaller fin widths or longer gate lengths give superior short-channel characteristics and higher threshold voltages (Vth) due to their enhanced gate electrostatic controllability. The reverse back bias modulates Vth and SS favorably by virtue of a body-tied device, maintaining the substrate current due to junction leakage of <;1 × 10-11 A.
Keywords :
MOSFET; isolation technology; leakage currents; JAM devices; JAM p-channel MOSFET; body-tied device; drain-induced-barrier-lowering; gate electrostatic controllability; junction leakage; junction-isolated bulk FinFET; junctionless accumulation-mode bulk FinFET; junctionless-accumulation-mode; reverse back bias modulates; short-channel characteristics; size 16 nm; substrate current; subthreshold swing; threshold voltages; transfer characteristics; FinFETs; Junctions; Logic gates; Silicon; Substrates; Junction isolation; Si bulk FinFET; junctionless (JL) field-effect transistor (FET); junctionless-accumulation-mode (JAM) FET;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2283291