DocumentCode :
413530
Title :
Locally contacted thin-film solar cells
Author :
Brammer, T. ; Hüpkes, I. ; Krause, M. ; Kluth, O. ; Muller, I. ; Steiberg, H. ; Rech, B.
Author_Institution :
Inst. of Photovoltaics, Forschungszentrum Julich GmbH, Germany
Volume :
1
fYear :
2003
fDate :
18-18 May 2003
Firstpage :
176
Abstract :
Concepts for locally contacted thin-film solar cells are presented. The approach is motivated by device simulations for the case of thin-film silicon solar cells with p-i-n structure. Our devices based on microcrystalline silicon have local contacts on either the p- or n-side made by photolithography, laser techniques or self organised etch masks. So far, no improvement in the open-circuit voltage could be obtained. Possible reasons are discussed.
Keywords :
elemental semiconductors; etching; masks; photolithography; self-assembly; semiconductor device models; semiconductor thin films; silicon; solar cells; Si; device simulation; laser technique; locally contacted thin-film solar cell; microcrystalline silicon; open-circuit voltage; p-i-n structure; photolithography; self organised etch mask;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
Type :
conf
Filename :
1305250
Link To Document :
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