Title :
p inversion layer Si solar cells as test for the I/sup -/S structure: results and prospects
Author :
König, D. ; Zahn, D.R.T. ; Reich, R. ; Gottfried, K. ; Ebest, G.
Author_Institution :
Inst. for Phys., Chemnitz, Germany
Abstract :
The I/sup -/S structure is a novel layer arrangement serving as a source for a negative drift field. Its application to solar cells is manifold and does not depend on Si. The deposition of the Aluminium Fluoride (AlF/sub 3/) layer involved can be implemented as final process in solar cell production; thus compatibility to existing processing sequences is given. First prototypes of a p inversion layer solar cell on Si were prepared providing evidence of function for the I/sup -/S structure. While conditions of preparation were far from optimum, a relative increase in conversion efficiency of 21% was achieved for solar cells with I/sup -/S structure versa solar cells without it. For testing the field effect impact the AlF/sub 3/ layer thickness was chosen to be 15 nm thus eliminating its additional advantage as anti-reflective coating (ARC).
Keywords :
aluminium compounds; elemental semiconductors; inversion layers; silicon; solar cells; 15 nm; 21 percent; AlF/sub 3/ layer thickness; AlF/sub 3/-Si; antireflective coating; conversion efficiency; field effect impact; negative drift field; p inversion layer; solar cell;
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3