DocumentCode
413697
Title
Hydrogenation of Si from SiN/sub x/:H films: how much hydrogen is really in the Si?
Author
Stavola, Michael ; Jiang, Fan ; Rohatgi, A. ; Kim, D. ; Holt, J. ; Atwater, H. ; Kalejs, J.
Author_Institution
Dept. of Phys., Lehigh Univ., Bethlehem, PA, USA
Volume
1
fYear
2003
fDate
18-18 May 2003
Firstpage
909
Abstract
A promising method to introduce H into Si solar cells in order to passivate bulk defects is by the post-deposition annealing of an H-rich, SiN/sub x/ surface layer. It previously has been difficult to characterize the small concentration of H that is introduced by this method. IR spectroscopy has been used together with marker impurities in the Si to determine the concentration and depth of H introduced into Si from an annealed SiN/sub x/ film.
Keywords
annealing; elemental semiconductors; hydrogenation; infrared spectra; passivation; silicon; solar cells; IR spectroscopy; Si:H; bulk defects; hydrogenation; passivation; post-deposition annealing; solar cells;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1305430
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