• DocumentCode
    413697
  • Title

    Hydrogenation of Si from SiN/sub x/:H films: how much hydrogen is really in the Si?

  • Author

    Stavola, Michael ; Jiang, Fan ; Rohatgi, A. ; Kim, D. ; Holt, J. ; Atwater, H. ; Kalejs, J.

  • Author_Institution
    Dept. of Phys., Lehigh Univ., Bethlehem, PA, USA
  • Volume
    1
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    909
  • Abstract
    A promising method to introduce H into Si solar cells in order to passivate bulk defects is by the post-deposition annealing of an H-rich, SiN/sub x/ surface layer. It previously has been difficult to characterize the small concentration of H that is introduced by this method. IR spectroscopy has been used together with marker impurities in the Si to determine the concentration and depth of H introduced into Si from an annealed SiN/sub x/ film.
  • Keywords
    annealing; elemental semiconductors; hydrogenation; infrared spectra; passivation; silicon; solar cells; IR spectroscopy; Si:H; bulk defects; hydrogenation; passivation; post-deposition annealing; solar cells;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1305430