DocumentCode
413735
Title
Pure experimental determination of surface recombination properties with high reliability
Author
Kampwerth, H. ; Rein, S. ; Glunz, S.W.
Author_Institution
Fraunhofer ISE, Freiburg, Germany
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1073
Abstract
A major task in developing new surface passivation layers for solar cells is their electrical characterization. A key value is the surface recombination velocity S. It can be extracted from the measured effective carrier lifetime /spl tau//sub eff/ in two ways: (1) with /spl tau//sub eff/ measured at one wafer and theoretical assumptions made for the bulk lifetime which leads to a major uncertainty in the S-determination. Or (2) with /spl tau//sub eff/ from a set of wafers with identically processed surfaces and different thicknesses W. Plotting /spl tau//sub eff/ in an 1//spl tau//sub eff/ vs. 1/W-diagram, the slope of a linear fit to the data equals 2S. The infeed grinder used in our study to prepare wafers with different thicknesses is an excellent tool to produce identical, planar surfaces with low damage depth and high reproducibility. Final damage-etching gives a perfect initial point for surface texture and passivation steps. By means of this technique S is determined for oxide-passivation surfaces on different doping concentrations.
Keywords
boron; carrier lifetime; doping profiles; elemental semiconductors; etching; grinding; passivation; silicon; solar cells; surface recombination; surface texture; Si:B; carrier lifetime; damage etching; doping concentrations; electrical properties; infeed grinder; linear fit data; low damage depth; oxide passivation surfaces; planar surfaces; solar cells; surface passivation layer; surface recombination properties; surface recombination velocity; surface texture; wafer surface;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306098
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