• DocumentCode
    413741
  • Title

    Electrical property evaluation of polycrystalline silicon thin film on textured substrate

  • Author

    Muhida, Riza ; Kawamura, Tomohiro ; Harano, Tomokazu ; Okajima, Masaya ; Matsui, Takuya ; Toyama, Toshihiko ; Okamoto, Hiroaki ; Honda, Shinya ; Takakura, Hideyuki ; Hamakawa, Yoshihiro

  • Author_Institution
    Dept. of Phys. Sci., Osaka Univ., Japan
  • Volume
    2
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    1096
  • Abstract
    The electrical conductivities of the poly-Si thin films deposited on the substrates with different surface texture have been studied using the alternating current (AC)-conductivity measurement technique. The activation energy of the dark conductivities for poly-Si films with deposited on relative low of the root mean square (rms) roughness (/spl sigma/) of 22 nm is close to 0.55 eV indicating intrinsic nature. On other hand, with increase in /spl sigma/>37 nm, poly-Si films exhibits n-type character. Changes in electrical conductivities of the poly-Si thin films in conjunction with the results on photovoltaic performances, optical reflectance, and microstructure are also discussed.
  • Keywords
    crystal microstructure; dark conductivity; elemental semiconductors; reflectivity; semiconductor thin films; silicon; solar cells; surface roughness; surface texture; Si; activation energy; alternating current conductivity measurement; dark conductivities; electrical conductivity; electrical properties; microstructure; optical reflectance; photovoltaic performances; polycrystalline silicon thin film; root mean square roughness; surface texture; textured substrate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306104