• DocumentCode
    413744
  • Title

    Surface passivation of silicon substrates using quinhydrone/methanol treatment

  • Author

    Takato, Hidetaka ; Sakata, Isao ; Shimokawa, Ryuichi

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
  • Volume
    2
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    1108
  • Abstract
    Quinhydrone/methanol treatment for the measurement of carrier lifetime in crystalline silicon substrates has been investigated. To estimate the surface passivation effect, the lifetimes of the silicon substrates were measured using the microwave photoconductive decay method. The 0.01 mol/dm/sup 3/ quinhydrone/methanol treatment exhibited a good passivation effect, and a very low surface recombination velocity was obtained. The quinhydrone/methanol treatment can provide accurate lifetime maps of single-crystalline and polycrystalline silicon wafers since a constant lifetime value without degradation can be obtained. Therefore, the quinhydrone/methanol treatment can be used for estimating the bulk lifetime of silicon substrates.
  • Keywords
    carrier lifetime; elemental semiconductors; passivation; photoconductivity; silicon; substrates; surface recombination; Si; carrier lifetime; microwave photoconductive decay method; polycrystalline silicon wafers; quinhydrone-methanol treatment; silicon substrates; single crystalline silicon wafers; surface passivation; surface recombination velocity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306107