DocumentCode
413744
Title
Surface passivation of silicon substrates using quinhydrone/methanol treatment
Author
Takato, Hidetaka ; Sakata, Isao ; Shimokawa, Ryuichi
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1108
Abstract
Quinhydrone/methanol treatment for the measurement of carrier lifetime in crystalline silicon substrates has been investigated. To estimate the surface passivation effect, the lifetimes of the silicon substrates were measured using the microwave photoconductive decay method. The 0.01 mol/dm/sup 3/ quinhydrone/methanol treatment exhibited a good passivation effect, and a very low surface recombination velocity was obtained. The quinhydrone/methanol treatment can provide accurate lifetime maps of single-crystalline and polycrystalline silicon wafers since a constant lifetime value without degradation can be obtained. Therefore, the quinhydrone/methanol treatment can be used for estimating the bulk lifetime of silicon substrates.
Keywords
carrier lifetime; elemental semiconductors; passivation; photoconductivity; silicon; substrates; surface recombination; Si; carrier lifetime; microwave photoconductive decay method; polycrystalline silicon wafers; quinhydrone-methanol treatment; silicon substrates; single crystalline silicon wafers; surface passivation; surface recombination velocity;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306107
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