DocumentCode :
413744
Title :
Surface passivation of silicon substrates using quinhydrone/methanol treatment
Author :
Takato, Hidetaka ; Sakata, Isao ; Shimokawa, Ryuichi
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
Volume :
2
fYear :
2003
fDate :
18-18 May 2003
Firstpage :
1108
Abstract :
Quinhydrone/methanol treatment for the measurement of carrier lifetime in crystalline silicon substrates has been investigated. To estimate the surface passivation effect, the lifetimes of the silicon substrates were measured using the microwave photoconductive decay method. The 0.01 mol/dm/sup 3/ quinhydrone/methanol treatment exhibited a good passivation effect, and a very low surface recombination velocity was obtained. The quinhydrone/methanol treatment can provide accurate lifetime maps of single-crystalline and polycrystalline silicon wafers since a constant lifetime value without degradation can be obtained. Therefore, the quinhydrone/methanol treatment can be used for estimating the bulk lifetime of silicon substrates.
Keywords :
carrier lifetime; elemental semiconductors; passivation; photoconductivity; silicon; substrates; surface recombination; Si; carrier lifetime; microwave photoconductive decay method; polycrystalline silicon wafers; quinhydrone-methanol treatment; silicon substrates; single crystalline silicon wafers; surface passivation; surface recombination velocity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
Type :
conf
Filename :
1306107
Link To Document :
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