• DocumentCode
    413770
  • Title

    Impurity and defect passivation in poly-Si films fabricated by aluminium-induced crystallisation

  • Author

    Widenborg, Per I. ; Sproul, Alistair B. ; Aberle, Armin G.

  • Author_Institution
    Centre of Excellence for Adv. Silicon Photovoltaics & Photonics, Univ. of New South Wales, Sydney, NSW, Australia
  • Volume
    2
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    1233
  • Abstract
    Data from resistivity, optical transmission and reflectance, and open-circuit voltage (V/sub oc/) measurements show hydrogen or ammonia plasma treatment greatly reduces the effective doping concentration, the parasitic optical absorption and improves the minority carrier properties of poly-Si films fabricated by aluminium-induced crystallisation (AIC) on glass substrates. Two 450 nm thick AIC poly-Si films on glass, one hydrogenated and one non-hydrogenated, were used to fabricate poly-Si/a-Si:H heterojunctions. The non-hydrogenated sample had a 1-sun V/sub oc/ of 136 mV and the hydrogenated sample had a 1-sun V/sub oc/ of 236 mV. The poor V/sub oc/ indicates that AIC poly-Si films are more suitable as seed layers than as absorber layers. However, heterojunctions are sensitive to surface conditions and thus further V/sub oc/ improvements may be possible by surface optimization of the hydrogenated AIC poly-Si film prior to the formation of the heterojunction.
  • Keywords
    crystallisation; doping profiles; electrical resistivity; elemental semiconductors; focused ion beam technology; hydrogenation; impurity distribution; minority carriers; passivation; plasma CVD coatings; plasma materials processing; semiconductor heterojunctions; semiconductor thin films; silicon; sputter etching; ultraviolet spectra; 136 mV; 236 mV; 450 nm; Si; aluminium induced crystallisation; ammonia plasma treatment; defect passivation; doping concentration; heterojunctions; hydrogen treatment; hydrogenated poly silicon films; hydrogenation; impurity passivation; minority carrier property; open circuit voltage; optical transmission; parasitic optical absorption; poly Si film; reflectance; resistivity; sputter etching; surface optimization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306140