Title :
Dry PSG etching for multicrystalline silicon solar cells
Author :
Nositschka, W.A. ; Kenanoglu, A. ; Voigt, O. ; Borchert, D. ; Kurz, H.
Author_Institution :
Inst. of Semicond. Electron., Aachen Univ., Germany
Abstract :
A dry plasma etching process for phosphor silicate glass (PSG) in a SiN-PECVD batch reactor is developed. In the same reactor PSG etching and anti reflective coating (ARC) can be performed successively. To demonstrate industrial feasibility screen printed solar cells are manufactured and compared to cells prepared by a standard wet chemical process.
Keywords :
amorphous semiconductors; antireflection coatings; elemental semiconductors; phosphosilicate glasses; silicon; solar cells; sputter etching; P/sub 2/O/sub 5/-SiO/sub 2/; Si; SiN PECVD batch reactor; anti reflection coating; dry PSG etching; dry plasma etching process; multicrystalline silicon solar cells; phosphor silicate glass; screen printed solar cells; wet chemical process;
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
