DocumentCode
413799
Title
Dry PSG etching for multicrystalline silicon solar cells
Author
Nositschka, W.A. ; Kenanoglu, A. ; Voigt, O. ; Borchert, D. ; Kurz, H.
Author_Institution
Inst. of Semicond. Electron., Aachen Univ., Germany
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1348
Abstract
A dry plasma etching process for phosphor silicate glass (PSG) in a SiN-PECVD batch reactor is developed. In the same reactor PSG etching and anti reflective coating (ARC) can be performed successively. To demonstrate industrial feasibility screen printed solar cells are manufactured and compared to cells prepared by a standard wet chemical process.
Keywords
amorphous semiconductors; antireflection coatings; elemental semiconductors; phosphosilicate glasses; silicon; solar cells; sputter etching; P/sub 2/O/sub 5/-SiO/sub 2/; Si; SiN PECVD batch reactor; anti reflection coating; dry PSG etching; dry plasma etching process; multicrystalline silicon solar cells; phosphor silicate glass; screen printed solar cells; wet chemical process;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306171
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