DocumentCode :
413827
Title :
The challenge to implement thin wafer potential with wire saw cutting technology
Author :
Mueller, André ; Cherradi, Nabih ; Nasch, Philippe M.
Author_Institution :
HCT Shaping Syst., Cheseaux, Switzerland
Volume :
2
fYear :
2003
fDate :
18-18 May 2003
Firstpage :
1475
Abstract :
The quests for a low-cost, high-efficiency solar cell can very much benefit from the immediate possible progress on the installed industrial base for mc-Si/c-Si wafering. One key for lowering the cell cost, and thus reducing the impact of the feedstock price on it, is the slicing of thinner wafers from the current average multi-crystalline wafer thickness of 280-350 /spl mu/m to significantly thinner wafer of the order of 100-200 /spl mu/m. In the present paper, we report a feasibility study that demonstrates the potentials for the industry to slice at a much thinner level (down to 100 /spl mu/m) using currently available multi-wire free-abrasive slicing technology.
Keywords :
abrasives; cutting; elemental semiconductors; silicon; solar cells; 100 to 200 micron; 280 to 350 micron; Si; Si wafer; cell cost; feedstock price; high-efficiency solar cell; multicrystalline wafer thickness; multiwire free abrasive slicing technology; thin wafer potential; wire saw cutting technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
Type :
conf
Filename :
1306203
Link To Document :
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