DocumentCode
413876
Title
Wide gap and low resistive hetero-structured SiC/sub X/ films for wide gap window of heterojunction solar cells
Author
Itoh, Takashi ; Hasegawa, Yuki ; Fujiwara, Takao ; Masuda, Ayako ; Nonomura, Shuichi
Author_Institution
Dept. of Electr. Eng., Gifu Univ., Japan
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1706
Abstract
The dependence of the properties of on the distance between the filament and the substrate in hetero-structured silicon carbon alloy (SiC/sub X/) films deposited with various deposition conditions by hot-wire CVD (Cat-CVD) has been studied. Based on above results, the B-doped hetero-structured SiC/sub X/ films have been deposited with a low film surface temperature, T/sub s/, condition. The optical energy gap in the low T/sub s/ sample was almost same as that of the high T/sub s/ sample, although the carbon content of the low T/sub s/ sample was smaller than that of the high T/sub s/ sample. The dark conductivity of the sample deposited with B/sub 2/H/sub 6//SiH/sub 4/ of 0.3% was 1.05/spl times/10/sup -1/ S/cm. This value was much larger than that of the high T/sub s/ sample deposited with B/sub 2/H/sub 6//SiH/sub 4/ of 0.42%.
Keywords
Raman spectra; amorphous semiconductors; boron; chemical vapour deposition; dark conductivity; electrical resistivity; energy gap; optical constants; semiconductor growth; semiconductor heterojunctions; semiconductor thin films; silicon compounds; solar cells; wide band gap semiconductors; B-doped heterostructured SiC/sub X/ films; Raman spectra; SiC:B; carbon content; dark conductivity; electrical resistivity; heterojunction solar cells; hot wire CVD; low resistive heterostructured SiC/sub X/ films; optical energy gap; silicon carbon films; surface temperature; wide gap heterostructured SiC/sub X/ films;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306260
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