• DocumentCode
    41400
  • Title

    Deposition of Inclined Co-Pt Film With Inclined Anisotropy

  • Author

    Honda, A. ; Honda, Naoki ; Ariake, Jun

  • Author_Institution
    Grad. Sch. of Eng., Tohoku Inst. of Technol., Sendai, Japan
  • Volume
    49
  • Issue
    7
  • fYear
    2013
  • fDate
    Jul-13
  • Firstpage
    3600
  • Lastpage
    3603
  • Abstract
    Deposition of inclined anisotropy film for bit-patterned media was studied using oblique incidence collimated sputtering. Co-Pt20 films with a thickness of 10 nm deposited on an annealed Pt/Ru under layer exhibited an inclination angle of the anisotropy axis of around 10° from the film normal corresponding to that of crystalline orientation. The anisotropy field and the inclination angle were estimated by comparing measured hysteresis loops with simulated loops. The estimated anisotropy field of the film, μ0Hκ, was around 1.2 T which indicated an expected anisotropy energy density of 6×105 J/m3. It was indicated that oblique incidence collimated sputtering is useful to fabricate inclined anisotropy recording media with high anisotropy.
  • Keywords
    cobalt alloys; crystal orientation; magnetic anisotropy; magnetic annealing; magnetic hysteresis; magnetic thin films; platinum alloys; ruthenium alloys; sputter deposition; CoPt20; PtRu; anisotropy axis; annealed Pt-Ru; bit-patterned media; crystalline orientation; hysteresis loops; inclination angle; inclined CoPt film; inclined anisotropy film; inclined anisotropy recording media; oblique incidence collimated sputtering; size 10 nm; Anisotropic magnetoresistance; Magnetic hysteresis; Magnetic recording; Media; Perpendicular magnetic anisotropy; Sputtering; Co-Pt film; hysteresis loop measurement; inclined anisotropy axis; oblique incidence collimated sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2013.2239964
  • Filename
    6559209