DocumentCode
41400
Title
Deposition of Inclined Co-Pt Film With Inclined Anisotropy
Author
Honda, A. ; Honda, Naoki ; Ariake, Jun
Author_Institution
Grad. Sch. of Eng., Tohoku Inst. of Technol., Sendai, Japan
Volume
49
Issue
7
fYear
2013
fDate
Jul-13
Firstpage
3600
Lastpage
3603
Abstract
Deposition of inclined anisotropy film for bit-patterned media was studied using oblique incidence collimated sputtering. Co-Pt20 films with a thickness of 10 nm deposited on an annealed Pt/Ru under layer exhibited an inclination angle of the anisotropy axis of around 10° from the film normal corresponding to that of crystalline orientation. The anisotropy field and the inclination angle were estimated by comparing measured hysteresis loops with simulated loops. The estimated anisotropy field of the film, μ0Hκ, was around 1.2 T which indicated an expected anisotropy energy density of 6×105 J/m3. It was indicated that oblique incidence collimated sputtering is useful to fabricate inclined anisotropy recording media with high anisotropy.
Keywords
cobalt alloys; crystal orientation; magnetic anisotropy; magnetic annealing; magnetic hysteresis; magnetic thin films; platinum alloys; ruthenium alloys; sputter deposition; CoPt20; PtRu; anisotropy axis; annealed Pt-Ru; bit-patterned media; crystalline orientation; hysteresis loops; inclination angle; inclined CoPt film; inclined anisotropy film; inclined anisotropy recording media; oblique incidence collimated sputtering; size 10 nm; Anisotropic magnetoresistance; Magnetic hysteresis; Magnetic recording; Media; Perpendicular magnetic anisotropy; Sputtering; Co-Pt film; hysteresis loop measurement; inclined anisotropy axis; oblique incidence collimated sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2013.2239964
Filename
6559209
Link To Document