DocumentCode
415397
Title
Single-step definition of channel waveguides with integral Bragg gratings in germanosilica-on-silicon wafers by direct UV writing
Author
Gawith, C.B.E. ; Emmerson, G.D. ; Watts, S.P. ; Albanis, V. ; Ibsen, M. ; Williams, R.B. ; Smith, P.G.R. ; McMeekin, S.G. ; Bonar, J.R. ; Laming, R.I.
Author_Institution
Optoelectron. Res. Centre, Southampton Univ., UK
fYear
2003
fDate
22-27 June 2003
Firstpage
511
Abstract
We present a single-step technique for defining channel waveguides with internal Bragg gratings in photosensitive germanosilica-on-silicon using two interfering focussed UV beams. Early devices exhibit reflection intensities of 80% with <0.15 nm bandwidth.
Keywords
Bragg gratings; elemental semiconductors; germanium compounds; infrared spectra; light reflection; optical focusing; optical materials; optical waveguides; reflectivity; silicon; silicon compounds; GeSiO2-Si; Si; channel waveguide; focussed UV beam; integral Bragg grating; photosensitive germanosilica-on-silicon; reflection intensity; silicon wafer; Bandwidth; Bragg gratings; Interference; Optical devices; Optical reflection; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN
0-7803-7734-6
Type
conf
DOI
10.1109/CLEOE.2003.1313573
Filename
1313573
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