DocumentCode :
415404
Title :
Laser micromachining: fabrication of optical elements in quartz
Author :
Kopitkovas, G. ; Lippert, T. ; David, C. ; Wokaun, A. ; Gobrecht, J.
Author_Institution :
Paul Scherrer Inst., Villigen, Switzerland
fYear :
2003
fDate :
22-27 June 2003
Firstpage :
556
Abstract :
In tihs paper, we present a method for an one step fabrication process of micro-optical elements in quartz by combining laser induced backside wet etching (LIBWE) and a simple projection method. Micro-optical elements in quartz with continuous structure profiles (e.g. beam homogenizers for high power lasers) are usually fabricated by photolithography, and subsequent transfer of the resist profile into quartz by reactive ion etching.
Keywords :
laser beam machining; micro-optics; micromachining; photolithography; quartz; sputter etching; continuous structure profile; laser micromachining; micro-optical element; optical element; optical fabrication process; photolithography; quartz; reactive ion etching; Cleaning; Laser ablation; Laser modes; Lenses; Lithography; Micromachining; Optical device fabrication; Resists; Temperature; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
Type :
conf
DOI :
10.1109/CLEOE.2003.1313618
Filename :
1313618
Link To Document :
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