• DocumentCode
    415543
  • Title

    A study of indium activation in silicon using pseudopotential calculations

  • Author

    Yan, X. ; Shishkin, M. ; De Souza, M.M.

  • Author_Institution
    Emerging Technol. Res. Centre, De Montfort Univ., Leicester, UK
  • Volume
    1
  • fYear
    2004
  • fDate
    16-19 May 2004
  • Firstpage
    283
  • Abstract
    Using the ab initio pseudopotential planewave technique, factors limiting the activation of indium in silicon are examined. The role of Carbon in overcoming some of these issues is clarified. It is found that (1) silicon self-interstitials deactivate In by trapping them on substitutional sites; Carbon, on the other hand, traps such self-interstitials with higher binding energy and prevents them from deactivating In (2) Carbon and Indium atoms at adjacent substitutional sites are activated whereas adjacent substitutional In results in deactivation of both atoms. Only second neighbour sites of indium are activated unlike the case of Boron, where all substitutional sites remain activated.
  • Keywords
    Fermi level; ab initio calculations; band structure; binding energy; carbon; elemental semiconductors; impurity states; indium; interstitials; pseudopotential methods; silicon; Si:C,In; Si:In; ab initio pseudopotential planewave technique; higher binding energy; pseudopotential calculations; self-interstitials; substitutional sites; Atomic measurements; Boron; Equations; Indium; Linear discriminant analysis; MOSFET circuits; Photonic band gap; Silicon; Threshold voltage; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 2004. 24th International Conference on
  • Print_ISBN
    0-7803-8166-1
  • Type

    conf

  • DOI
    10.1109/ICMEL.2004.1314618
  • Filename
    1314618