DocumentCode
415543
Title
A study of indium activation in silicon using pseudopotential calculations
Author
Yan, X. ; Shishkin, M. ; De Souza, M.M.
Author_Institution
Emerging Technol. Res. Centre, De Montfort Univ., Leicester, UK
Volume
1
fYear
2004
fDate
16-19 May 2004
Firstpage
283
Abstract
Using the ab initio pseudopotential planewave technique, factors limiting the activation of indium in silicon are examined. The role of Carbon in overcoming some of these issues is clarified. It is found that (1) silicon self-interstitials deactivate In by trapping them on substitutional sites; Carbon, on the other hand, traps such self-interstitials with higher binding energy and prevents them from deactivating In (2) Carbon and Indium atoms at adjacent substitutional sites are activated whereas adjacent substitutional In results in deactivation of both atoms. Only second neighbour sites of indium are activated unlike the case of Boron, where all substitutional sites remain activated.
Keywords
Fermi level; ab initio calculations; band structure; binding energy; carbon; elemental semiconductors; impurity states; indium; interstitials; pseudopotential methods; silicon; Si:C,In; Si:In; ab initio pseudopotential planewave technique; higher binding energy; pseudopotential calculations; self-interstitials; substitutional sites; Atomic measurements; Boron; Equations; Indium; Linear discriminant analysis; MOSFET circuits; Photonic band gap; Silicon; Threshold voltage; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2004. 24th International Conference on
Print_ISBN
0-7803-8166-1
Type
conf
DOI
10.1109/ICMEL.2004.1314618
Filename
1314618
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