DocumentCode :
415645
Title :
A new channel percolation model for VT shift in discrete-trap memories
Author :
Ielmini, D. ; Compagnoni, C. Monzio ; Spinelli, A.S. ; Lacaita, A.L. ; Gerardi, C.
Author_Institution :
Dipt. di Elettronica ed Informazione, Politecnico di Milano, Italy
fYear :
2004
fDate :
25-29 April 2004
Firstpage :
515
Lastpage :
521
Abstract :
In this work we studied the mechanisms for channel conduction in discrete-trap memories (DTMs). It is shown that the threshold voltage VT in the cell corresponds to a percolation condition in the channel, where the inverted layers connect source to drain. A numerical model is presented which is able to calculate the local profile of VT in the channel, and to evaluate the global VT in the cell according to a channel percolation condition. The model is shown to account for the size dependence of VT in DTM cells, and for the staircase charge-loss characteristics observed on ultrascaled devices. The implications of the percolation mechanism from the reliability point of view are finally discussed in details.
Keywords :
CMOS integrated circuits; flash memories; integrated circuit modelling; integrated circuit reliability; leakage currents; percolation; VT shift; channel percolation model; discrete-trap memories; numerical model; staircase charge-loss characteristics; ultrascaled devices; Electrostatics; Leakage current; Monte Carlo methods; Nanocrystals; Nonvolatile memory; Numerical models; Silicon; Space charge; Threshold voltage; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN :
0-7803-8315-X
Type :
conf
DOI :
10.1109/RELPHY.2004.1315382
Filename :
1315382
Link To Document :
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