DocumentCode
416133
Title
Circuit partitioning and RF isolation by through-substrate trenches
Author
Sinaga, S.M. ; Polyakov, A. ; Bartek, M. ; Burghartz, J.N.
Author_Institution
ECTM/DIMES, Delft Univ. of Technol., Netherlands
Volume
2
fYear
2004
fDate
1-4 June 2004
Firstpage
1519
Abstract
In this work, theoretical and experimental analysis of RF crosstalk suppression by substrate thinning and trenching is performed. Medici (2D solver) simulation results show that high isolation can be achieved by using high resistivity thinned substrate and through-substrate trenches. Measurements on dedicated G-S-G test structures implemented on thinned Si substrates (thickness 20-100 μm) with and without through-substrate trenches (trench width 5-100 μm) show that isolation between two single-ended capacitive substrate contacts can effectively be controlled by these trenches. While the partial trenches provide additional isolation of ∼10 dB at 1 GHz, the full trenches (forming isolated silicon islands) provide additional isolation of ∼30 dB at 1 GHz.
Keywords
capacitance; circuit simulation; crosstalk; electrical contacts; elemental semiconductors; integrated circuit testing; isolation technology; machining; radiofrequency integrated circuits; silicon; 1 GHz; 20 to 100 micron; 5 to 100 micron; Medici simulation; RF crosstalk suppression; RF isolation; Si; circuit partitioning; dedicated G-S-G test structures; high resistivity thinned substrate trenches; isolated silicon islands; partial trenches; single-ended capacitive substrate contacts; substrate thinning; substrate trenching; thinned Si substrates; through-substrate trenches; Circuit simulation; Conductivity; Crosstalk; Medical simulation; Performance analysis; Radio frequency; Silicon; Testing; Thickness control; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2004. Proceedings. 54th
Print_ISBN
0-7803-8365-6
Type
conf
DOI
10.1109/ECTC.2004.1320316
Filename
1320316
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