Title :
Calibration and characterization of 900 nm silicon narrow-band radiation thermometers
Author :
Sakuma, Fumihiro ; Ma, Laina
Author_Institution :
Nat. Metrol. Inst. of Japan, Tsukuba, Japan
Abstract :
This paper describes the calibration and characterization of the 900 nm standard radiation thermometers. Two methods are used for the calibration. One is the four fixed-point calibration and the other is the spectral responsivity calibration according to the ITS-90. Characterizations of the radiation thermometers for the size-of-source effect, distance effect, ambient temperature effect, zero offset, stability, are also shown.
Keywords :
calibration; elemental semiconductors; silicon; spectral methods of temperature measurement; thermometers; transfer standards; 900 nm; Si; ambient temperature effect; distance effect; fixed point calibration; narrow band radiation thermometers; size of source effect; spectral responsivity calibration; stability; standard radiation thermometers; zero offset;
Conference_Titel :
SICE 2003 Annual Conference
Conference_Location :
Fukui, Japan
Print_ISBN :
0-7803-8352-4