DocumentCode :
418612
Title :
Layer-by-layer stereolithography (SL) of complex medium
Author :
Gong, Xun ; Liu, Bosui ; Katehi, Linda P B ; Chappell, William J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume :
1
fYear :
2004
fDate :
20-25 June 2004
Firstpage :
325
Abstract :
A laser-based layer-by-layer stereolithography (SL) processing technique is utilized to realize finely periodic effective medium for the first time. By the local control of dielectric materials in a small electrical scale, an effective medium can be created to have a controllable dielectric constant and lower loss tangent than that of the constituent materials. Preliminary measurement results have proved this concept and validated the quasi-static approximation formulas used to characterize the materials. The excellent fabrication flexibility and tolerance of SL processing enable us to create unique microwave composite materials.
Keywords :
composite insulating materials; dielectric losses; inhomogeneous media; laser materials processing; microwave materials; periodic structures; permittivity; stereolithography; SL processing tolerance; complex medium; dielectric constant control; dielectric loss tangent; dielectric material local control; finely periodic effective medium; layer-by-layer stereolithography; microwave composite materials; quasi-static approximation formulas; stratified medium; window pane medium; Dielectric constant; Dielectric losses; Dielectric materials; Dielectric substrates; Frequency; Micromachining; Optical device fabrication; Resonator filters; Silicon; Stereolithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas and Propagation Society International Symposium, 2004. IEEE
Print_ISBN :
0-7803-8302-8
Type :
conf
DOI :
10.1109/APS.2004.1329638
Filename :
1329638
Link To Document :
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