Title :
Frequency response improvement of 120 GHz fT SiGe HBT by optimizing the contact configurations
Author :
Hsieh, M.W. ; Ho, C.C. ; Wang, H.P. ; Lee, C.Y. ; Chen, G.J. ; Tang, D.T. ; Chan, Y.-J.
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Taiwan
Abstract :
For characterizing the frequency and power response of the SiGe HBT devices, the HBT devices with different base and collector contact configuration structure have been fabricated by using the 0.18 μm high-speed SiGe BiCMOS technologies. In this work, we investigated three different types of layout with the same emitter area AE=0.3×10.16 μm2, including single base and single collector contact, double base and single collector contacts, and double base and double collector contacts. Regarding the maximum output power and cutoff frequency (fT), the double bases and double collectors structure is the optimized layout, which provides a 6.4 dBm maximum output power and a PAE of 40 % at 2.4 GHz. It also leads to achieve a higher cutoff frequency due to the reduction of contact resistances.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; circuit optimisation; contact resistance; frequency response; heterojunction bipolar transistors; power bipolar transistors; semiconductor device models; semiconductor materials; 0.18 micron; 120 GHz; 2.4 GHz; 6.4 dB; PAE; SiGe; SiGe HBT devices; base contact configuration structure; collector contact configuration structure; contact configuration optimization; contact resistances; frequency response; high speed SiGe BiCMOS technologies; BiCMOS integrated circuits; Contacts; Cutoff frequency; Frequency response; Gallium arsenide; Germanium silicon alloys; Heterojunction bipolar transistors; Parasitic capacitance; Power generation; Silicon germanium;
Conference_Titel :
Microwave Symposium Digest, 2004 IEEE MTT-S International
Print_ISBN :
0-7803-8331-1
DOI :
10.1109/MWSYM.2004.1339138