DocumentCode
421111
Title
Polysiloxane based optical splitters with low insertion loss fabricated through direct photolithography
Author
Takase, Hideaki ; Tamaki, Kentarou ; Maeda, Yukin ; Huang, Fujun ; Eriyama, Yuichi
Author_Institution
Tsukuba Res. Labs., JSR Corp., Ibaraki, Japan
Volume
1
fYear
2004
fDate
23-27 Feb. 2004
Firstpage
113
Abstract
Optical splitters with high resolution at Y branches have been fabricated through direct photolithography by using photosensitive polysiloxane based materials. The splitters showed low insertion losses with excellent uniformity at 1310 nm and 1550 nm.
Keywords
optical beam splitters; optical fabrication; optical losses; optical polymers; optical waveguides; photolithography; sol-gel processing; 1310 nm; 1550 nm; channel waveguides; low insertion loss; optical fabrication; optical splitters; photolithography; photosensitive material; polysiloxane; sol-gel reactions;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication Conference, 2004. OFC 2004
Conference_Location
Los Angeles, CA, USA
Print_ISBN
1-55752-772-5
Type
conf
Filename
1359202
Link To Document