Title :
Polysiloxane based optical splitters with low insertion loss fabricated through direct photolithography
Author :
Takase, Hideaki ; Tamaki, Kentarou ; Maeda, Yukin ; Huang, Fujun ; Eriyama, Yuichi
Author_Institution :
Tsukuba Res. Labs., JSR Corp., Ibaraki, Japan
Abstract :
Optical splitters with high resolution at Y branches have been fabricated through direct photolithography by using photosensitive polysiloxane based materials. The splitters showed low insertion losses with excellent uniformity at 1310 nm and 1550 nm.
Keywords :
optical beam splitters; optical fabrication; optical losses; optical polymers; optical waveguides; photolithography; sol-gel processing; 1310 nm; 1550 nm; channel waveguides; low insertion loss; optical fabrication; optical splitters; photolithography; photosensitive material; polysiloxane; sol-gel reactions;
Conference_Titel :
Optical Fiber Communication Conference, 2004. OFC 2004
Conference_Location :
Los Angeles, CA, USA
Print_ISBN :
1-55752-772-5
