Design and fabrication of nanophotonic devices

Author

Freude, Wolfgang ; Poulton, Christopher Vincent ; Koos, Christian ; Brosi, Jan ; Glöckler, Felix ; Wang, Jin ; Chakam, Guy-Aymar ; Fujii, Masafumi

Author_Institution

High-Frequency & Quantum Electron. Lab., Karlsruhe Univ., Germany

Volume

1

fYear

2004

fDate

4-8 July 2004

Firstpage

4

Abstract

High index contrast integratable optical devices are investigated. Simulations are run on a parallel computer using an efficient wavelet FDTD code. For 2D photonic crystals with line defects and random perturbations, we have developed a numerically fast semi-analytical method. The effects due to sidewall roughnesses are studied for straight strips and for 2D photonic crystal line defect waveguides. For a microring filter and a photonic crystal slab, we compare numerical results to measurements using an upscaled microwave model. Fabrication steps for the material systems SOI and InGaAsP/InP are discussed, and FIB milling is demonstrated for GaAs/AlGaAs.

Keywords

aluminium compounds; focused ion beam technology; gallium arsenide; indium compounds; integrated optics; nanotechnology; optical elements; optical waveguide filters; optical waveguide theory; photonic crystals; rough surfaces; semiconductor devices; semiconductor technology; silicon-on-insulator; 2D photonic crystal line defect waveguides; FDTD; FIB milling; GaAs-AlGaAs; InGaAsP-InP; SOI; high index contrast integratable optical devices; integrated optics devices; microring filter; nanophotonic devices; sidewall roughness; straight strips; Computational modeling; Computer simulation; Concurrent computing; Finite difference methods; Nanoscale devices; Optical device fabrication; Optical devices; Photonic crystals; Strips; Time domain analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2004. Proceedings of 2004 6th International Conference on

Print_ISBN

0-7803-8343-5

Type

conf

DOI

10.1109/ICTON.2004.1360234

Filename

1360234