Title :
Strip Waveguide With High Diffusion-Doped
Author :
De-Long Zhang ; Cong-Xian Qiu ; Fang Han ; Bei Chen ; Ping-Rang Hua ; Dao-Yin Yu ; Pun, Edwin Yue-Bun
Author_Institution :
Sch. of Precision Instrum. & Opto-Electron. Eng., Tianjin Univ., Tianjin, China
Abstract :
We report a Ti:Er:LiNbO3 strip waveguide with high diffusion-doped surface Er3+ concentration. The waveguide was fabricated with a technological process in sequence of preparation of noncongruent, Li-deficient LiNbO3 substrate by performing Li-poor vapor transport equilibration treatment on a congruent Z-cut LiNbO3 plate, diffusion of 40-nm-thick Er metal film, and fabrication of 8-μm-wide Ti-diffused strip waveguide. The waveguide retains the LiNbO3 phase and shows the waveguiding characteristics similar to the conventional Ti:LiNbO3 waveguide. Secondary ion mass spectrometry study shows that the Er3+ diffusion reservoir was exhausted and the profile is Gaussian with a surface concentration two times larger than that of the conventional Ti:Er:LiNbO3 waveguide. The waveguide shows stable 1547-nm small-signal enhancement under the 1480-nm pumping without serious optical damage observed, and a 5-dB signal enhancement is obtained for the available coupled pump power of only 90 mW. A saturated net gain as much as 5 dB/cm is predicted theoretically.
Keywords :
Gaussian distribution; diffusion; erbium; lithium compounds; optical fabrication; optical pumping; optical waveguides; secondary ion mass spectra; titanium; Er metal film diffusion; Gaussian profile; LiNbO3:Ti,Er; congruent Z-cut LiNbO3 plate; coupled pump power; high diffusion-doped Er3+ concentration; high diffusion-doped surface Er3+ concentration; optical damage; saturated net gain; secondary ion mass spectrometry; signal enhancement; strip waveguide; Crystals; Lithium niobate; Optical device fabrication; Optical surface waves; Optical waveguides; Strips; Surface waves; ${rm Er}^{3+}$ diffusiondoping; ${rm Ti}{:}{rm Er}{:}{rm LiNbO}_{3}$ waveguide; high ${rm Er}^{3+}$ concentration;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2013.2296527