Title :
Generation and application of high intensity XUV lights by high-order harmonics
Author :
Midorikawa, Katsumi ; Takahashi, Eiji ; Nabekawa, Yasuo ; Hasegawa, Hirokazu
Author_Institution :
Laser Technol. Lab., RIKEN, Saitama
Abstract :
We report our efforts on observation of multiphoton process in the XUV region including high intensity high harmonic generation and its application technology such as beam splitters and multilayer mirrors
Keywords :
mirrors; multiphoton processes; optical beam splitters; optical harmonic generation; optical multilayers; ultraviolet sources; XUV light generation; XUV region; application technology; beam splitters; high harmonic generation; high intensity XUV lights; high-order harmonics; multilayer mirrors; multiphoton process;
Conference_Titel :
Lasers and Electro-Optics, 2004. (CLEO). Conference on
Conference_Location :
San Francisco, CA
Print_ISBN :
1-55752-777-6
