• DocumentCode
    421973
  • Title

    Generation and application of high intensity XUV lights by high-order harmonics

  • Author

    Midorikawa, Katsumi ; Takahashi, Eiji ; Nabekawa, Yasuo ; Hasegawa, Hirokazu

  • Author_Institution
    Laser Technol. Lab., RIKEN, Saitama
  • Volume
    1
  • fYear
    2004
  • fDate
    16-21 May 2004
  • Abstract
    We report our efforts on observation of multiphoton process in the XUV region including high intensity high harmonic generation and its application technology such as beam splitters and multilayer mirrors
  • Keywords
    mirrors; multiphoton processes; optical beam splitters; optical harmonic generation; optical multilayers; ultraviolet sources; XUV light generation; XUV region; application technology; beam splitters; high harmonic generation; high intensity XUV lights; high-order harmonics; multilayer mirrors; multiphoton process;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2004. (CLEO). Conference on
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    1-55752-777-6
  • Type

    conf

  • Filename
    1361435