Title :
Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography
Author :
Zhuang, Y.X. ; Frandsen, L.H. ; Harpoth, A. ; Thorhauge, M. ; Kristensen, M. ; Borel, P.I. ; Bogaerts, W. ; Baets, R.
Author_Institution :
Res. Center COM, Tech. Univ. of Denmark, Lyngby, Denmark
Abstract :
Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.
Keywords :
integrated optics; numerical analysis; optical design techniques; optical fabrication; optical materials; optical tuning; optical waveguides; photonic crystals; ultraviolet lithography; 248 nm; deep UV lithography; photonic crystal waveguide fabrication; wavelength tuning;
Conference_Titel :
Optical Fiber Communication Conference, 2004. OFC 2004
Conference_Location :
Los Angeles, CA, USA
Print_ISBN :
1-55752-772-5
