Title :
There are no fundamental limits to optical nanolithography
Author_Institution :
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
Abstract :
This work demonstrates that optical techniques, particularly coherent interference effects, can not only reach nanoscale dimensions but also offer the many advantages of optical lithography including parallel writing of large numbers of nanostructures over large areas, alignment to underlying patterns, and cost-effectiveness.
Keywords :
micro-optics; nanolithography; optical fabrication; coherent interference effects; nanophotonics; optical lithography; optical nanolithography; parallel writing; Lenses; Lithography; Materials science and technology; Nanolithography; Optical imaging; Optical interferometry; Optical refraction; Optical variables control; Physics; Resists;
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
DOI :
10.1109/LEOS.2004.1363111
