DocumentCode
422660
Title
There are no fundamental limits to optical nanolithography
Author
Brueck, S.R.J.
Author_Institution
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
Volume
1
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
63
Abstract
This work demonstrates that optical techniques, particularly coherent interference effects, can not only reach nanoscale dimensions but also offer the many advantages of optical lithography including parallel writing of large numbers of nanostructures over large areas, alignment to underlying patterns, and cost-effectiveness.
Keywords
micro-optics; nanolithography; optical fabrication; coherent interference effects; nanophotonics; optical lithography; optical nanolithography; parallel writing; Lenses; Lithography; Materials science and technology; Nanolithography; Optical imaging; Optical interferometry; Optical refraction; Optical variables control; Physics; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN
0-7803-8557-8
Type
conf
DOI
10.1109/LEOS.2004.1363111
Filename
1363111
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