DocumentCode :
424383
Title :
Larger-than-Vdd Forward Body Bias in Sub-0.5V Nanoscale CMOS
Author :
Ananthan, H. ; Kim, Chul Han ; Roy, Kaushik
Author_Institution :
Purdue University, West Lafayette, IN
fYear :
2004
fDate :
11-11 Aug. 2004
Firstpage :
8
Lastpage :
13
Abstract :
This paper examines the effectiveness of larger-than-Vdd forward body bias (FBB) in nanoscale bulk CMOS circuits where Vdd is expected to scale below 0.5V. Equal-to and larger-than Vdd FBB schemes offer unique advantages over conventional FBB such as simple design overhead and reverse body bias capability respectively. Compared to zero body bias, they improve process-variation immunity and achieve 71% and 78% standby leakage savings at iso performance and iso active power at room temperature. We also suggest a novel temperature-adaptive body bias scheme to control active leakage and achieve 22% and 40% active power savings at higher temperatures.
Keywords :
Forward Body Bias; Junction Leakage; Process Variations; Sub-threshold Leakage; Forward Body Bias; Junction Leakage; Process Variations; Sub-threshold Leakage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Power Electronics and Design, 2004. ISLPED '04. Proceedings of the 2004 International Symposium on
Conference_Location :
Newport Beach, CA, USA
Print_ISBN :
1-58113-929-2
Type :
conf
Filename :
1382952
Link To Document :
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