• DocumentCode
    424383
  • Title

    Larger-than-Vdd Forward Body Bias in Sub-0.5V Nanoscale CMOS

  • Author

    Ananthan, H. ; Kim, Chul Han ; Roy, Kaushik

  • Author_Institution
    Purdue University, West Lafayette, IN
  • fYear
    2004
  • fDate
    11-11 Aug. 2004
  • Firstpage
    8
  • Lastpage
    13
  • Abstract
    This paper examines the effectiveness of larger-than-Vdd forward body bias (FBB) in nanoscale bulk CMOS circuits where Vdd is expected to scale below 0.5V. Equal-to and larger-than Vdd FBB schemes offer unique advantages over conventional FBB such as simple design overhead and reverse body bias capability respectively. Compared to zero body bias, they improve process-variation immunity and achieve 71% and 78% standby leakage savings at iso performance and iso active power at room temperature. We also suggest a novel temperature-adaptive body bias scheme to control active leakage and achieve 22% and 40% active power savings at higher temperatures.
  • Keywords
    Forward Body Bias; Junction Leakage; Process Variations; Sub-threshold Leakage; Forward Body Bias; Junction Leakage; Process Variations; Sub-threshold Leakage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Power Electronics and Design, 2004. ISLPED '04. Proceedings of the 2004 International Symposium on
  • Conference_Location
    Newport Beach, CA, USA
  • Print_ISBN
    1-58113-929-2
  • Type

    conf

  • Filename
    1382952