DocumentCode :
424742
Title :
A class of impedance tomography based sensors for semiconductor manufacturing
Author :
Krüger, Michiel V P ; Poolla, Kameshwar ; Spanos, Costas J.
Author_Institution :
Dept. of Mech. Eng., California Univ., Berkeley, CA, USA
Volume :
3
fYear :
2004
fDate :
June 30 2004-July 2 2004
Firstpage :
2178
Abstract :
This paper explores the feasibility of a class of sensors for semiconductor manufacturing based on electrical impedance tomography. We briefly summarize the role of sensors in semiconductor manufacturing and the essential principles of electrical impedance tomography. In this paper we discuss the design and operation of a prototype etch rate sensor based on these ideas. We also propose a novel sensor to measure the wafer potential during semiconductor manufacturing. We discuss simulation results from this novel sensor.
Keywords :
electric impedance imaging; image sensors; semiconductor device manufacture; electrical impedance tomography; semiconductor manufacturing; sensor; wafer potential;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 2004. Proceedings of the 2004
Conference_Location :
Boston, MA, USA
ISSN :
0743-1619
Print_ISBN :
0-7803-8335-4
Type :
conf
Filename :
1383784
Link To Document :
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