DocumentCode
427853
Title
PLS-based optimal quality control model for TE process
Author
Kai, Song ; Hai-qing, Wang ; Ping, Li
Author_Institution
Inst. of Ind. Process Control, Zhejiang Univ., Hangzhou, China
Volume
2
fYear
2004
fDate
10-13 Oct. 2004
Firstpage
1354
Abstract
The necessary and sufficient conditions of fault detectability under the PLS framework are discussed. A new partial least squares optimum detecting model (PLS-ODM) is proposed to improve the monitoring performance of the PLS method. This PLS-ODM is deduced according to the fault subspace and the VP index of the process variables that could be used to estimate the importance of the measurements to the quality. Compared with traditional PLS, PLS-ODM has the stronger fault detecting power, and could detect much weaker important process faults exactly in time. The application of it in Tennessee Eastman (TE) benchmark statistical quality control confirms that its detection performance is improved remarkably to make it possible to avoid process shutdown to reduce cost and stabilize product quality.
Keywords
chemical technology; fault diagnosis; least squares approximations; optimal control; quality control; statistical analysis; PLS-based optimal quality control model; Tennessee Eastman benchmark statistical quality control; VP index; fault subspace; partial least squares optimum detecting model; process variables; Chemical elements; Fault detection; Industrial control; Least squares methods; Matrix decomposition; Process control; Quality control; Statistical distributions; Tellurium; Vectors;
fLanguage
English
Publisher
ieee
Conference_Titel
Systems, Man and Cybernetics, 2004 IEEE International Conference on
ISSN
1062-922X
Print_ISBN
0-7803-8566-7
Type
conf
DOI
10.1109/ICSMC.2004.1399814
Filename
1399814
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