Title :
Optimisation of photoplot based mask fabrication
Author :
Dumbravescu, N. ; Nedelcu, S. ; Dascalu, E. ; Babarada, F.
Author_Institution :
Nat. Inst. for R&D in Microtechnologies, IMT Bucharest, Romania
Abstract :
The paper reports on recent approaches in photoplot-type reticles design and technology applied by the authors, for cheap mask fabrication in the micro-technologies field. The main optimizations of this cheap method are discussed. Some examples to obtain masks for rapid prototyping in micro-optics and for a SAW-type gas sensor are given, too.
Keywords :
gas sensors; micro-optics; reticles; surface acoustic wave sensors; SAW-type gas sensor; cheap method; mask fabrication; micro-optics; microtechnologies field; photoplot optimization; photoplot-type reticles; rapid prototyping; Buffer storage; Costs; High-resolution imaging; Image resolution; Laser beams; Optical device fabrication; Repeaters; Research and development; Testing; Writing;
Conference_Titel :
Semiconductor Conference, 2004. CAS 2004 Proceedings. 2004 International
Print_ISBN :
0-7803-8499-7
DOI :
10.1109/SMICND.2004.1402852
