DocumentCode :
4317
Title :
Design and Optimization of Nonvolatile Multibit 1T1R Resistive RAM
Author :
Zangeneh, Mohsen ; Joshi, Akanksha
Author_Institution :
Dept. of Electr. & Comput. Eng., Boston Univ., Boston, MA, USA
Volume :
22
Issue :
8
fYear :
2014
fDate :
Aug. 2014
Firstpage :
1815
Lastpage :
1828
Abstract :
Memristor-based random access memory (RAM) is being explored as a potential replacement for flash memory to sustain the historic trends in the improvement of density, access time, and energy consumption of nonvolatile memory. In this paper, we present the detailed functionality of multibit one-transistor one-memristor (1T1R) cell-based memory arrays, and propose circuit-level performance and energy models for an individual memory cell and the memory array as a whole. We consider titanium dioxide (TiO2)and hafnium oxide (HfOx)based memristors, and for these technologies, there is a sub-10% difference between energy and performance computed using our models and HSPICE simulations. Using a performance-driven design approach, the energy-optimized TiO2-based resistive RAM (RRAM) array consumes the least write (4.06 pJ/b) and read energy (188 fJ/b) when storing 3 b/cell for 100-ns write and 1-ns read access times. Similarly, HfOx-based RRAM array consumes the least write (365 fJ/b) and read energy (173 fJ/b) when storing 3 b/cell for 1-ns write and 200-ns read access times. We also present a detailed analysis of the implications of process, voltage, and temperature variations on the performance and energy consumption of a multibit RRAM cell.
Keywords :
cellular arrays; circuit optimisation; energy consumption; hafnium compounds; integrated circuit design; logic design; memristors; random-access storage; titanium compounds; transistor circuits; HSPICE simulations; HfOx; RRAM array; TiO2; circuit-level performance; energy consumption; energy models; energy-optimized resistive RAM array; flash memory; hafnium oxide; memory arrays; memristor-based random access memory; multibit RRAM cell; multibit one-transistor one-memristor cell; nonvolatile multibit resistive RAM; optimization; performance-driven design approach; read access times; read energy; temperature variations; time 1 ns; time 100 ns; time 200 ns; titanium dioxide; write access times; write energy; Computer architecture; Hafnium compounds; Memristors; Microprocessors; Nonvolatile memory; Random access memory; Resistance; Memristor; modeling; reliability; resistive random access memory (RRAM); resistive random access memory (RRAM).;
fLanguage :
English
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-8210
Type :
jour
DOI :
10.1109/TVLSI.2013.2277715
Filename :
6595151
Link To Document :
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