DocumentCode
433352
Title
Bayesian approach to reliability projection for high k dielectric thin films
Author
Luo, Wen ; Kuo, Way ; Kuo, Yue
Author_Institution
Dept. of Ind. Eng., Texas A&M Univ., College Station, TX, USA
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
186
Lastpage
187
Abstract
This research develops a Bayesian approach which is suitable for reliability estimation and projection of nano devices. It combines a lifetime distribution with an empirical acceleration function and places the model parameters into a hierarchical Bayesian framework. The value of the approach lies in that it can fully utilize available information in modeling uncertainty and provide plausible predictions with limited resources at the design stage of a new device.
Keywords
Bayes methods; Weibull distribution; dielectric thin films; integrated circuit reliability; semiconductor device reliability; Bayesian reliability projection method; Weibull parameter; empirical acceleration function; hierarchical Bayesian framework; high k dielectric thin films; lifetime distribution; nano devices; reliability estimation; uncertainty modeling; Bayesian methods; Capacitors; Dielectric substrates; Dielectric thin films; Flowcharts; High K dielectric materials; High-K gate dielectrics; Industrial engineering; Life testing; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2004 IEEE International
Print_ISBN
0-7803-8517-9
Type
conf
DOI
10.1109/IRWS.2004.1422771
Filename
1422771
Link To Document