• DocumentCode
    433352
  • Title

    Bayesian approach to reliability projection for high k dielectric thin films

  • Author

    Luo, Wen ; Kuo, Way ; Kuo, Yue

  • Author_Institution
    Dept. of Ind. Eng., Texas A&M Univ., College Station, TX, USA
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    186
  • Lastpage
    187
  • Abstract
    This research develops a Bayesian approach which is suitable for reliability estimation and projection of nano devices. It combines a lifetime distribution with an empirical acceleration function and places the model parameters into a hierarchical Bayesian framework. The value of the approach lies in that it can fully utilize available information in modeling uncertainty and provide plausible predictions with limited resources at the design stage of a new device.
  • Keywords
    Bayes methods; Weibull distribution; dielectric thin films; integrated circuit reliability; semiconductor device reliability; Bayesian reliability projection method; Weibull parameter; empirical acceleration function; hierarchical Bayesian framework; high k dielectric thin films; lifetime distribution; nano devices; reliability estimation; uncertainty modeling; Bayesian methods; Capacitors; Dielectric substrates; Dielectric thin films; Flowcharts; High K dielectric materials; High-K gate dielectrics; Industrial engineering; Life testing; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2004 IEEE International
  • Print_ISBN
    0-7803-8517-9
  • Type

    conf

  • DOI
    10.1109/IRWS.2004.1422771
  • Filename
    1422771