• DocumentCode
    43356
  • Title

    A Low-Cost Low-Noise Amplifier in Poly-Si TFT Technology

  • Author

    Soo Youn Kim ; Roy, Kaushik

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • Volume
    10
  • Issue
    12
  • fYear
    2014
  • fDate
    Dec. 2014
  • Firstpage
    1110
  • Lastpage
    1114
  • Abstract
    Low-temperature polycrystalline silicon (poly-Si) thin-film transistors (LTPS TFTs) are emerging as promising devices for low-cost applications owing to their low manufacturing cost. Since LTPS TFTs can be fabricated on the insulating substrates such as plastic or glass, on-chip spiral inductors achieve high quality of characteristic. In this paper, we observed that inductors using LTPS TFT technology have a 14% higher Q-factor and a 16% higher self-resonance frequency compared to corresponding CMOS-bulk technology from electromagnetic (EM) simulation. It allows compensating low trans-conductance (gm) of LTPS TFTs due to inherent grain boundaries (GBs) in the poly-Si channel. With the properly optimized dimension of LTPS TFT technology, we designed a low-noise amplifier (LNA) on glass substrate having a gain = 15.4 dB, noise figure (NF)=2.8 dB, and third-order input intercept point (IIP3) = 3.9 dBm at 2.4 GHz with a 2 V voltage supply. The results demonstrate that low-cost RF design with LTPS TFTs can achieve CMOS-like performance.
  • Keywords
    CMOS integrated circuits; Q-factor; elemental semiconductors; grain boundaries; inductors; insulating materials; low noise amplifiers; polymers; radiofrequency amplifiers; silicon; thin film transistors; CMOS-bulk technology; LNA; LTPS TFT technology; Q-factor; Si; frequency 2.4 GHz; gain 15.4 dB; glass substrate; grain boundaries; inductors; insulating substrate; low noise amplifier; low temperature polycrystalline silicon; low-cost RF design; noise figure 2.8 dB; poly-Si TFT technology; poly-Si channel; self-resonance frequency; thin film transistors; voltage 2 V; Glass; Inductors; Noise; Radio frequency; Silicon; Substrates; Thin film transistors; Grain boundaries (GBs); low-noise amplifier (LNA); low-temperature polycrystalline silicon (poly-Si) thin-film transistors (LTPS TFTs); radio frequency (RF);
  • fLanguage
    English
  • Journal_Title
    Display Technology, Journal of
  • Publisher
    ieee
  • ISSN
    1551-319X
  • Type

    jour

  • DOI
    10.1109/JDT.2014.2351617
  • Filename
    6882770