DocumentCode
434041
Title
Average electrical properties of polycrystalline silicon grains
Author
Spoutai, S.V.
Author_Institution
Novosibirsk State Tech. Univ., Russia
fYear
2004
fDate
21-24 Sept. 2004
Firstpage
20
Lastpage
23
Abstract
A polycrystalline semiconductor film consists of various size crystalline grains that have properties of crystalline silicon. The grains are randomly spatially oriented thus decreasing the magnitude of piezoresistance. Depending on the dopant concentration within the grains, the depleted regions originated owing to carrier trapping on the grain boundary can have various dimension. As the carrier concentration within depletion region is lower, the resistance and piezoresistance can be higher than in the rest of the grain. Results of the calculation show that the deviation of the average parameters, such as concentration of free carriers, specific resistivity, and piezoresistance coefficient, can be significantly different from that obtained on assumption of a uniform free carrier distribution in the crystallite.
Keywords
carrier density; electric properties; electric resistance; grain boundaries; piezoresistance; semiconductor thin films; silicon; Si; average electrical properties; carrier concentration; crystalline grains; depleted regions; dopant concentration; grain boundary; piezoresistance; polycrystalline semiconductor film; polycrystalline silicon grains; Conductivity; Crystallization; Grain boundaries; Insulation; Piezoresistance; Semiconductor films; Semiconductor process modeling; Silicon; Space charge; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Instrument Engineering Proceedings, 2004. APEIE 2004. 2004 7th International Conference on Actual Problems of
Conference_Location
Novosibirsk, Russia
Print_ISBN
0-7803-8476-8
Type
conf
Filename
1427175
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