• DocumentCode
    434041
  • Title

    Average electrical properties of polycrystalline silicon grains

  • Author

    Spoutai, S.V.

  • Author_Institution
    Novosibirsk State Tech. Univ., Russia
  • fYear
    2004
  • fDate
    21-24 Sept. 2004
  • Firstpage
    20
  • Lastpage
    23
  • Abstract
    A polycrystalline semiconductor film consists of various size crystalline grains that have properties of crystalline silicon. The grains are randomly spatially oriented thus decreasing the magnitude of piezoresistance. Depending on the dopant concentration within the grains, the depleted regions originated owing to carrier trapping on the grain boundary can have various dimension. As the carrier concentration within depletion region is lower, the resistance and piezoresistance can be higher than in the rest of the grain. Results of the calculation show that the deviation of the average parameters, such as concentration of free carriers, specific resistivity, and piezoresistance coefficient, can be significantly different from that obtained on assumption of a uniform free carrier distribution in the crystallite.
  • Keywords
    carrier density; electric properties; electric resistance; grain boundaries; piezoresistance; semiconductor thin films; silicon; Si; average electrical properties; carrier concentration; crystalline grains; depleted regions; dopant concentration; grain boundary; piezoresistance; polycrystalline semiconductor film; polycrystalline silicon grains; Conductivity; Crystallization; Grain boundaries; Insulation; Piezoresistance; Semiconductor films; Semiconductor process modeling; Silicon; Space charge; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Instrument Engineering Proceedings, 2004. APEIE 2004. 2004 7th International Conference on Actual Problems of
  • Conference_Location
    Novosibirsk, Russia
  • Print_ISBN
    0-7803-8476-8
  • Type

    conf

  • Filename
    1427175